Method of improving delamination in an image forming material utilizing 2-diazo-1,2-quinone compounds having fluorine containing substituent groups

ABSTRACT

A 2-diazo-1,2-quinone compound having a substituent group containing an alkyl group which is substituted by at least one fluorine atom is described. This compound has a capacity to change its polarity when exposed to light. The invention also provides an image forming material in which the invention compound is added to at least one of laminated layers. When these laminated layers are exposed to light, the adhesiveness of the compound-containing layer to its adjoining layer is reduced effectively due to the polarity-changing ability of the compound, thus making the easy delamination of the layers possible. This compound is applicable to many instances in which image receiving sheets are used, such as the formation of a multi-color image by a transfer method (a color proof, for example) and the preparation of a printing plate of the delamination development type.

This is a divisional of application No. 08/093,722 filed Jul. 20, 1993,U.S. Pat. No. 5,384,227 which is a divisional of application No.07/736,343 filed Jul. 26, 1991, U.S. Pat. No. 5,312,905.

FIELD OF THE INVENTION

This invention relates to novel 2-diazo-1,2-quinone compounds which arecapable of changing polarity when exposed to light. It also relates toimage forming materials prepared by making use of these compounds, whichare applicable to recording materials such as color proof imagereceiving sheets, photoresists, printing plates, PS plates, and thelike.

BACKGROUND OF THE INVENTION

In the case of a multiple layer recording material, it is preferable toprepare the material in such a manner that the adhesive strength betweenits layers can be controlled. Even in the case of a monolayer recordingmaterial, it may be convenient for many purposes if the material isprepared in such a manner that the adhesive strength between itssupporting body and the monolayer can be controlled.

For example, a means for reducing the adhesive strength between layersmaking use of the effect of light has been disclosed in European Patent0,156,535, in which a surfactant is formed when the layers are exposedto light. Also, a delamination development method has been disclosed inPhotographic Science and Engineering, Vol. 22, No. 3, pp. 138-141(1977), in which delamination is effected by the formation of gas from adiazo compound or an azide compound when the compound is exposed tolight. Neither of them, however, seems to have satisfactory effect.

When a 2-diazo-1,2-quinone compound is exposed to light, it is convertedinto nitrogen gas and an indene carboxylic acid derivative induced byWolff rearrangement. Recording materials prepared by making use of suchan optical rearrangement reaction, especially positive type sensitivecompositions, have been disclosed, for example, in U.S. Pat. No.3,046,110, U.S. Pat. No. 3,046,111, U.S. Pat. No. 3,046,123, U.S. Pat.No. 3,046,124, U.S. Pat. No. 3,106,465, U.S. Pat. No. 3,130,047, andJP-B-46-21247 (corresponding to U.S. Pat. No. 3,640,992) (the term"JP-B" as used herein means an "examined Japanese patent publication").However, there are no reports on the application of the opticalrearrangement reaction to a process for the reduction of adhesivestrength between layers with the aid of exposure to light.

Also, changes in the adhesive strength between a layer and a base boardcaused by the photolysis of these diazo compounds have been applied todry type image formation processes. For example, an image formingprocess has been disclosed in JP-A-52-57819 (the term "JP-A" as usedherein means an "unexamined published Japanese patent application").According to this process, a transparent plastic film coated with alayer of a sensitive composition comprising a diazonium salt and abinder is superposed on a supporting sheet coated with an adhesive layerto prepare a laminate. When the thus prepared laminate is exposed tolight and then the plastic film is delaminated from the supportingsheet, the unexposed portion of the sensitive composition layer remainson the transparent plastic sheet while the exposed portion remains onthe supporting sheet.

In addition, processes for the formation of relief images have beendisclosed, for example, in JP-A-54-79032, JP-A-54-79033 andJP-A-54-79034 (corresponding to U.S. Pat. Nos. 4,210,711, 4,334,006 and4,396,700). According to these processes, an imagewise forming materialcomprising a sensitive composition is superposed on a supporting sheetwhich is noncohesive at ordinary temperatures, and the thus preparedlaminate is subjected to imagewise exposure and then heated at atemperature higher than the softening point of the sensitivecomposition. Thereafter, the recording material is delaminated from thesupporting sheet at a temperature which is lower than the heatingtemperature. In this way, the exposed image portion of the sensitivecomposition layer is selectively adhered to the supporting sheet to forma relief image.

However, because of an insufficient difference between the adhesivestrength of the exposed and unexposed portions, none of these dry typeprocesses can produce satisfactory images.

An image receiving sheet which comprises two image receiving layers oforganic polymer materials superposed on a support has been disclosed inJP-A-61-189535 (corresponding to U.S. Pat. No. 4,766,053), in which thedelamination strengths between the two image receiving layers andbetween the second image receiving layer and an image layer can becontrolled in such a manner that the image layer can be transferred ontoa permanent support not only singly but also together with the secondimage receiving layer at will. This image receiving sheet has anadvantage in that optical gain of an image can be controlled by eitherintroducing or not introducing a step for the transfer of the secondimage receiving layer and by changing the thickness of the second imagereceiving layer to be transferred. In addition, because of the thicknessof the image receiving layer being thin on the image layer, the imagereceiving layer can reproduce the irregularity of the surface of thepermanent support more accurately to give a natural matting effect. Thisimage receiving sheet, therefore, can be used suitably for thepreparation of a color proof having excellent print approximation.

This process, however, has the following problems with regard to thesetting condition of the adhesiveness between the first and second imagereceiving layers.

1) The adhesiveness between the first and second image receiving layersshould be strong when an image is transferred to the image receivingsheet (if the adhesiveness is too weak, delamination will occur betweenthe first and second image receiving layers when the image support isdelaminated).

2) The adhesiveness between the first and second image receiving layersshould be weak when an image layer is transferred to a permanent support(if the adhesiveness is too strong, picking will occur when the imagereceiving sheet support is delaminated).

SUMMARY OF THE INVENTION

In view of the above, it is therefore an object of the present inventionto provide a novel compound which, when added to at least one layer of amultiple layer recording material or to the layer of a monolayerrecording material, can weaken the adhesiveness between the layers in amultiple layer recording material or between the monolayer and the othermaterial in a monolayer recording material by the effect of the exposureto light. This invention also provides an image forming material in amonolayer recording material prepared by making use of the novelcompound. Another principal object of the present invention is toprovide a novel compound which can weaken the adhesiveness of thesurface of a coating layer by localizing on the surface.

Particularly, the present invention provides a 2-diazo-1,2-quinonecompound having a substituent group containing an alkyl group which issubstituted by at least one fluorine atom. Preferably, the2-diazo-1,2-quinone compound is a 2-diazo-1,2-naphthoquinone compoundwherein the 4- or the 5-position of the compound is substituted by thesubstituent group containing an alkyl group which is substituted by atleast one fluorine atom. Also, the 2-diazo-1,2-quinone compoundpreferably is a 2-diazo-1,2-naphthoquinone compound wherein the alkylgroup which is substituted by at least one fluorine atom is bound to the2-diazo-1,2-naphthoquinone group through a sulfonate or an amide.

Also, the present invention provides an image forming material whichcomprises a layer superposed on a support, wherein the layer contains a2-diazo-1,2-quinone compound having a substituent group containing analkyl group which is substituted by at least one fluorine atom.

Other objects and advantages of the present invention will be apparentas from description below.

DETAILED DESCRIPTION OF THE INVENTION

In order to overcome the aforementioned problems involved in the art,the inventors of the present invention have conducted intensive studiesand found that 2-diazo-1,2-quinone compounds, especially a new compounddeveloped by the inventors, can exhibit a suitable function for use in aprocess in which the adhesiveness between layers is weakened by means oflight exposure. That is, the objects of the present invention wereachieved by the development of a novel 2-diazo-1,2-quinone compoundhaving a substituent group containing an alkyl group which issubstituted by at least one fluorine atom and by the development of animage forming material having a layer containing the novel compound.

The 2-diazo-1,2-quinone compound according to the present inventioninclude compounds which are represented by the following formula (I):##STR1## wherein one of R¹ and R² is a hydrogen atom and the other is asubstituent group containing an alkyl group which is substituted by atleast one fluorine atom.

Suitable examples of the substituent group containing an alkyl groupwhich is substituted by at least one fluorine atom include groups thatare represented by the following formula (II) or (III):

    --SO.sub.2 --O--R.sup.3                                    (II)

    --SO.sub.2 --NR.sup.4 R.sup.5                              (III)

wherein R³ and at least one of R⁴ and R⁵ represent a substituent groupcontaining an alkyl group which has 2 to 20 carbon atoms and issubstituted by at least 3 fluorine atoms.

Illustrative examples of the substituent group containing an alkyl groupwhich has 2 to 20 carbon atoms and is substituted by at least 3 fluorineatoms include alkyl groups which are substituted by fluorine atoms, suchas 2,2,2-trifluoroethyl, 3,3,3,-trifluoropropyl,1,1,1,3,3,3,-hexafluoro-2-propyl, 1H,1H-pentafluoropropyl,1H,1H-heptafluorobutyl, 1H,1H-nonafluoropentyl, 1H,1H-undecafluorohexyl,1H,1H,2H,2H-pentafluoro-1-butyl, 1H,1H,2H,2H-nonafluoro-1-hexyl,1H,1H,2H,2H-tridecafluoro-1-octyl, 1H,1H,2H,2H-heptadecafluoro-1-decyl,1H,1H,2H,2H-henicosafluoro-1-dodecyl, 1H,1H,5H-octafluoropentyl,1H,1H,7H-dodecafluoroheptyl, 1H,1H,9H-hexadecafluorononyl,1H,3H,3H-tetrafluoropropyl, 1H,5H,5H-octafluoropentyl,1H,7H,7H-dodecafluoroheptyl, 1H,9H,9H-hexadecaflurononyl,1H,11H,11H-eicosafluoroundecyl, perfluoroalkylmethyl,perfluoroalkylethyl (wherein perfluoroalkyl is represented by theformula C_(n) F_(2n+1), n=2 to 18) groups, and the like, and phenylgroups containing an alkyl group which is substituted by fluorine atoms,such as perfluoroalkylmethylphenyl, perfluoroalkylethylphenyl,perfluoroalkylmethoxyphenyl, perfluoroalkylethoxyphenyl,(perfluoroalkylmethylthio) phenyl, (perfluoroalkylethylthio) phenyl,perfluoroalkylmethylsulfonylphenyl,perfluoroalkylethylsulfonylphenyl,perfluoroalkylmethoxycarbonylphenyl,perfluoroalkylethoxycarbonylphenyl groups, and the like.

A particularly preferred compound among the compounds represented byformula (I) may have a structure in which the 2-diazo-1,2-naphthoquinonegroup is substituted by a sulfonate group containing an alkyl group,most preferably at the 4-position. In this instance, the alkyl groupcontained in the sulfonate group may have 2 to 20 carbon atoms,preferably 4 to 15 carbon atoms, and at least half the number ofhydrogen atoms in the alkyl group are substituted by fluorine atoms.

The following describes a process for the synthesis of the compoundrepresented by formula (I).

The compound represented by formula (I) can be obtained by thecondensation reaction of a compound containing a hydroxy group or anamino group and also containing an alkyl group which is substituted byfluorine atoms, as represented by the following formula (IV) or (V),with a 2-diazo-1,2-naphthoquinonesulfonyl chloride compound representedby the following formula (VI), in the presence of a deoxidizer:

    HO--R.sup.3                                                (IV)

    HNR.sup.4 R.sup.5                                          (V)

wherein R³, R⁴ and R⁵ have the same meaning as described above, and##STR2## wherein one of R⁶ and R⁷ is a hydrogen atom and the other is agroup represented by --SO₂ --Cl.

Suitable examples of the compound represented by the formula (VI)include 2-diazo-1,2-naphthoquinone-4-sulfonyl chloride and2-diazo-1,2-naphthoquinone-5-sulfonyl chloride.

The solvent for use in the condensation reaction may be selected fromvarious organic solvents, but preferably it is selected from diethylether, acetone, dichloromethane, chloroform, carbon tetrachloride,tetrahydrofuran, dioxane, benzene, toluene, acetonitrile, and the like.The deoxidizer may be selected from various organic amines, butpreferably it is selected from pyridine, diethylamine, triethylamine,N,N-dimethylaniline, N,N-diethylaniline, and the like. The condensationreaction may be carried out preferably using 1 mole equivalent of thecompound represented by formula (IV) or (V), 1 to about 1.2 molesequivalent of the compound of formula (VI), and 1 to about 1.2 molesequivalent of the deoxidizer, at a preferred reaction temperature ofabout from -10° C. to 40° C.

Similar to the case of commonly known 2-diazo-1,2-quinone compounds, the2-diazo-1,2-quinone compound of the present invention undergoes Wolffrearrangement when exposed to light and subsequently forms nitrogen gasand a carboxylic acid compound. When the 2-diazo-1,2-quinone compound ofthe present invention is added to at least one layer of a multiple layerrecording material and the resulting material is exposed to light, thecompound changes its polarity due to the optical rearrangement reactiondescribed above and, as the result, effectively reduces the adhesionstrength between the compound containing layer and its adjoining layer.Consequently, if it is necessary to have a step for a strongadhesiveness between these two layers and another step for a weakadhesiveness among a series of steps of an image forming process usingthe just-described multiple layer recording material, such a differentadhesion strength required for each of the two steps can be realized byadding the 2-diazo-1,2-quinone compound of the present invention to atleast one of these two layers and by further interposing a lightexposure step between these two steps (e.g., a light of an ultra-highpressure murcury lump (1 kw) at a distance of 90 cm for 15 seconds orlonger).

In consequence, it is possible to apply the 2-diazo-1,2-quinone compoundof the present invention effectively to image forming materials whichforms visible difference between exposed portion and unexposed portionsuch as a color proof image receiving sheets and a photoresist, aprinting plate, and the like based on the delamination development.

The 2-diazo-1,2-quinone compound of the present invention is containedin a layer with being localized on the surface thereof whereas knowncompounds are uniformly present in the layer. Therefore, the use of thecompound of the present invention effectively results in reduction ofadhesion strength.

The following describes an example of the application of the2-diazo-1,2-quinone compound of the present invention to an imagereceiving sheet for color proof use.

Though not specifically limited, a support for use in an image receivingsheet may be selected from chemically and thermally stable materialssuch as a polyethylene terephthalate film, a polycarbonate film and, asoccasion calls, a sheet of paper laminated with a polyethylene film. Inorder to improve the adhesion strength of the support to a first imagereceiving layer, the support may be subjected to a surface treatmentsuch as corona discharge or glow discharge, or may be superposed with anundercoat layer. The undercoat layer may be effected by any means,provided that it can improve the adhesion strength between the supportand the first image receiving layer, but preferably it is effected bysilan coupling.

The organic polymer material to be used in the first layer may beselected preferably from those materials having a softening point ofabout 80° C. or lower as determined by the Vicat test, more precisely,in accordance with the standard method for the measurement of thesoftening point of polymers, ASTM D 1235, established by AmericanSociety for Testing Materials. An advantage of using such a lowsoftening point organic polymer material is that, when a transferableimage which has been transferred to an image receiving sheet material isre-transferred to a permanent support such as paper by heat andpressure, the image receiving layer is adhered effectively to thepermanent support in proportion to the irregularity of the surface ofthe support. The use of such a polymer material also improves printapproximation because the steps for matting and the like can be omittedat the time of delamination. On the contrary, if a polymer materialhaving a high softening point is used, not only is a high temperaturerequired for the transfer step, but also the dimensional stability of animage and like properties will be spoiled. Consequently, when apolyethylene terephthalate film or the like is used as a support of asensitive material or an image receiving material, the organic polymermaterial to be laminated may have a softening point of about 80° C. orlower as determined by the Vicat test, preferably 60° C. or lower, morepreferably 50° C. or lower.

At least one compound selected from the group consisting of thefollowing illustrative examples may be used as the polymer materialhaving a softening point of about 80° C. or lower: polyolefins such aspolyethylene, polypropylene and the like, ethylene copolymers such as acopolymer of ethylene and vinyl acetate, a copolymer of ethylene and anacrylic ester and the like, polyvinyl chloride, vinyl chloridecopolymers such as a copolymer of vinyl chloride and vinyl acetate andthe like, polyvinylidene chloride, vinylidene chloride copolymers,polystyrene, styrene copolymers such as a copolymer of styrene and(meth)acrylate and the like, polyvinyltoluene, vinyltoluene copolymerssuch as a copolymer of vinyltoluene and (meth)acrylate and the like,poly(meth)acrylate, (meth)acrylate copolymers such as a copolymer ofbutyl(meth)acrylate and vinyl acetate and the like, vinyl acetate,polyamide resins such as nylon, copolymerized nylon, N-alkoxymethylnylon and the like, synthetic rubber, and chlorinated rubber. Otheruseful organic polymer materials having a softening point of about 80°C. or lower are disclosed, for example, in "Handbook of Plasticsproperties" (edited by Japan Plastics Molding Industries Association,Japan Federation of Plastics Industries; published by Kogyo-Chosa-Kai;Oct. 25, 1968).

The softening points of these organic polymer materials maysubstantially be lowered by adding a plasticizer which is compatiblewith these polymers. Even in the case of an organic polymer materialhaving a softening point of more than 80° C., it is possible to lowerthe softening point substantially to a level of 80° C. or less by theaddition of a compatible plasticizer. In order to control the adhesionstrength of the first image receiving layer to its support or to asecond organic polymer layer to be superposed on the first layer, theseorganic polymer materials may be further mixed with various types ofother polymers, adhesion improvers, surfactants, lubricants, and thelike, provided that the softening point does not exceed 80° C. by theuse of these additives.

The first organic polymer layer may preferably have a thickness of from1 to 50 μm, more preferably from 5 to 30 μm. One reason for such alimitation is that when an image which has been transferred to an imagereceiving sheet material is re-transferred to a permanent support, thelayer should have a thickness which is greater than the irregularitydepth of the surface of the support. Another reason is that when atransferable image which has different irregularity depths between itsline and non-line portions is transferred to an image receiving sheetmaterial, the first layer may be used as a thin film in the case of amonocolor system, but, in the case of a combination of four colors foruse such as a color proof, it is preferable to make the first layer intoa film which is four times thicker than the irregularity depth of theline and non-line portions of each color. A thickness of the first layerwhich is too great would result in failure in absorbing the irregularitydepth of the surface of the support and nonuniform separation. On theother hand, the first layer being too thin would require extra step fordrying.

The following describes a second image receiving layer which issuperposed on the first layer. An object of the use of this secondorganic polymer layer is to re-transfer an image which has beentransferred to an image receiving sheet to a permanent support togetherwith only the thin second layer film by delaminating a support of theimage receiving sheet together with its first image receiving layer, sothat the irregularity of the surface of the permanent support remainsunchanged and, therefore, an image close to the gloss of the actualprint material can be obtained without requiring any special mattingtreatment. In consequence, any organic polymer material is applicable tothe second image receiving layer, provided that it satisfies theadhesiveness relationships disclosed in U.S. Pat. No. 4,766,053.However, such an organic polymer material may preferably be selectedfrom polymer materials having 10° C. or higher softening points thanthat of the first image receiving layer, depending on the organicpolymer material used in the first layer, the image forming materialused in the formation of a transferable image, and the permanent supportmaterial. In this instance, examples of the permanent support includeart paper, coated paper, wood free paper, woody paper, metal sheets,synthetic films, and the like.

At least one compound selected from the group consisting of thefollowing illustrative examples may be used as the polymer material ofthe second image receiving layer: polyolefins such as polyethylene,polypropylene and the like, ethylene copolymers such as a copolymer ofethylene and vinyl acetate, a copolymer of ethylene and an acrylic esterand the like, polyvinyl chloride, vinyl chloride copolymers such as acopolymer of vinyl chloride and vinyl acetate and the like,polyvinylidene chloride, vinylidene chloride copolymers, polystyrene,styrene copolymers such as a copolymer of styrene and (meth)acrylate andthe like, polyvinyltoluene, vinyltoluene copolymers such as a copolymerof vinyltoluene and (meth)acrylate and the like, poly(meth )acrylate,(meth)acrylate copolymers such as a copolymer of butyl (meth)acrylateand vinyl acetate and the like, vinyl acetate, polyamide resins such asa nylon, copolymerized nylon, N-alkoxymethyl nylon and the like,synthetic rubber, chlorinated rubber, and cellulose compounds.

As an effective means to control physical film properties of the secondimage receiving layer such as stickiness, thermal adhesiveness, shelflife of the finally obtained image (adhesion resistance), and the like,a photopolymerizable monomer may be added to the second layer so thatthe second layer can be cured by its exposure to light after there-transfer of an image to a permanent support.

The thickness of the second image receiving layer may preferably be inthe range of from 0.1 to 10 μm, more preferably from 0.5 to 5 μm. Athickness of the second layer which is too great would spoil theirregularity of the surface of a permanent support and increase thegloss of the support unnecessarily, thus reducing the printapproximation. On the other hand, the second layer being too thin wouldresult in damage of the layer. When two or more image receiving layersare transferred to a permanent support, it is preferable to keep thetotal thickness within the above range.

According to the image receiving sheet of the present invention, the2-diazo-1,2-quinone compound of the present invention is added to atleast one of the first and second image receiving layers. In view of thethickness of the image receiving layers, it is preferred that thecompound is added to the second image receiving layer. The compound maybe added to the corresponding layer in an amount of from 0.01 to 60% byweight, preferably from 1 to 20% by weight, on a solid basis. If theamount of the compound is smaller than 0.01% by weight, an insufficientdecrease in the inter-layer adhesion strength would result. If theamount is larger than 60% by weight, the formation of an image havingpoor qualities would result due to the effect of nitrogen gas generatedafter exposure to light, although the decrease in the inter-layeradhesion strength would be sufficient.

The above image receiving sheet may be incorporated into the imageforming material system for use, according to U.S. Pat. No. 4,766,053.

Image forming techniques as described in U.S. Pat. No. 4,766,053 may beapplied to a process for the formation of a transferable image in whichthe image receiving sheet of the present invention is used, but it maybe most preferable to use a support on which a delamination layer issuperposed. Without a delamination layer, an image portion itself mustbe transferred directly to a permanent support. In such an instance,according to various experiments, there are a limited number of suitablematerials, and it is necessary to increase the thermal transfertemperature. In contrast, the use of a delamination layer isadvantageous in that separation of functions becomes possible,temperature latitude increases, and a wide variety of permanent supportmaterials can be used. The delamination layer can be provided accordingto process described, for example, in U.S. Pat. No. 4,482,625.Additional materials used for the delamination layer include vinylacetate copolymers, vinyl chloride copolymers, polyvinylidene chlorides,vinylidene chloride copolymers, ethylene copolymers such asethylene/vinyl acetate, ethylene/ester acrylate, ethylene/vinyl chlorideand ethylene/acrylate, polyvinyl acetal such as polyvinyl butyral andpolyvinyl formal, rubbers such as rubber chloride and synthetic rubber,and polyolefines such as polyethylene and polypropylene, etc. Thedelamination layer may have a thickness of 0.1 to 10 μm. When aphotographic image is developed, the delamination layer under thenon-image portion may be subjected to etching, leaving only the part ofthe layer under the image portion, or a color image may be formed on theentire delamination layer without etching.

To make use of the capacity of the compound of the present invention tochange its polarity, the compound can be applied effectively to imageforming materials such as a photoresist, a print board, and the like,according to the aforementioned references which disclose recordingmaterials using an optical rearrangement reaction, in which thedevelopment of images is carried out using a developer such as an alkalisolution or the like. In such a case, excellent results, e.g., increasein developer-resistance in the unexposed portion, may also be obtainedbecause of the ability of the 2-diazo-1,2-quinone compound of thepresent invention to localize itself easily on the surface of an imagereceiving layer. These results cannot be obtained by the use of any2-diazo-1,2-quinone compound that has no alkyl group substituted byfluorine atoms.

For the purpose of ensuring delamination between the layers desired, atreatment for increasing adhesion strength can be conducted so as toprevent delamination between the compound-containing layer and theadjoining layer opposite to the layer desired to be separated therefrom(e.g., addition of adhesion accelerator and undercoating of base).

Examples of the present invention are given below by way of illustrationand not by way of limitation. All parts, percents, ratios and the likeare by weight unless indicated otherwise.

EXAMPLE 1 synthesis of4-(1H,1H,2H,2H-heptadecafluorodecyloxy)-sulfonyl-2-diazo-1,2-naphthoquinone!

A mixture consisting of 13.4 g of 2-diazo-1,2-naphthoquinone-4-sulfonylchloride, 23.2 g of 1H,1H,2H,2H-heptadecafluorodecanol, and 100 ml ofacetonitrile was stirred. To this mixture, 20 ml of acetonitrilecontaining 5.16 g of triethylamine was added dropwise. After completionof the dropwise addition, the resulting reaction mixture was addeddropwise to ice-cold water.

The thus formed product was extracted with ethyl acetate, and theextract was dried with anhydrous magnesium sulfate to remove thesolvent. Thereafter, the crude product thus obtained was subjected tocolumn chromatography to isolate 15.6 g of purified4-(1H,1H,2H,2H-heptadecafluorodecyloxy)sulfonyl-2-diazo-1,2-naphthoquinonehaving a melting point (decomposition point) of 125° to 127° C.

EXAMPLE 2 synthesis of5-(1H,1H,2H,2H-heptadecafluorodecyloxy)sulfonyl-2-diazo-1,2-naphthoquinone!

A mixture consisting of 13.4 g of 2-diazo-1,2-naphthoquinone-5-sulfonylchloride, 23.2 g of 1H,1H,2H,2H-heptadecafluorodecanol, and 100 ml oftetrahydrofuran was stirred. To this mixture 20 ml of tetrahydrofurancontaining 5.16 g of triethylamine was added dropwise. After completionof the dropwise addition, the resulting reaction mixture was addeddropwise to ice-cold water to obtain a precipitate.

The thus formed product was collected by filtration and washed withwater to obtain a crude product. Thereafter, the crude product thusobtained was subject to recrystallization using an acetone/methanolsolvent system to isolate 21.6 g of purified5-(1H,1H,2H,2H-heptadecafluorodecyloxy)sulfonyl-2-diazo-1,2-naphthoquinonehaving a melting point (decomposition point) of 127° to 129° C.

EXAMPLE 3 synthesis of4-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-naphthoquinone!

1) Synthesis of (4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenol

A mixture consisting of 12.6 g of p-thiohydroquinone and 180 ml ofdimethylacetamide was stirred at -20° C. To this mixture, 19.3 g ofsodium methoxide dissolved in 28% methanol solution and then 57.4 g of1H,1H,2H,2H-heptadecafluorodecyl iodide dissolved in dimethylacetamidewere added, in that order. When the disappearance of the startingmaterials was confirmed by means of thin layer chromatography, thereaction mixture was added to water, and the crude product thus formedwas isolated by extracting it with ethyl acetate and drying the extractto remove the solvents. Thereafter, the phenol compound thus isolatedwas purified by means of column chromatography.

2) Synthesis of4-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-naphthoquinone

A mixture consisting of 5.37 g of 2-diazo-1,2-naphthoquinone-4-sulfonylchloride, 11.5 g of the just obtained(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenol, and 50 ml ofacetonitrile was stirred on an ice bath. To this mixture, 10 ml ofacetonitrile containing 2.12 g of triethylamine was added dropwise.After completion of the dropwise addition, the resulting reactionmixture was added dropwise to ice-cold water to obtain a precipitate.The thus formed precipitate was collected by filtration and washed withwater to obtain a crude product. Thereafter, the crude product thusobtained was subjected to recrystallization using an acetone/methanolsolvent system to isolate 13.3 g of purified4-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-naphthoquinonehaving a melting point (decomposition point) of 121° to 123° C.

EXAMPLE 4 synthesis of5-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-naphthoquinone!

This compound was prepared from 5.37 g of2-diazo-1,2-naphthoquinone-5-sulfonyl chloride and 11.5 g of the(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenol synthesized in Example3, part 1), in a manner similar to that in Example 3. In this way, 14.5g of the purified compound having a melting point (decomposition point)of 138° to 140° C. was obtained.

EXAMPLE 5 synthesis of4-(4-(1H,1H,2H,2H-heptadecafluorodecyloxy)carbonyl)phenoxysulfonyl-2-diazo-1,2-naphthoquinone!

1) Synthesis of 4-(1H,1H,2H,2H-heptadecafluorodecyloxy)carbonyl)phenol

A mixture consisting of 5.52 g of 4-hydroxybenzoic acid, 18.6 g of1H,1H,2H,2H-heptadecafluorodecanol and 0.7 ml of concentrated sulfuricacid and 150 ml of toluene was subjected to heating reflux. After 5hours of the reflux, the reaction mixture was subjected to extractionwith ethyl acetate, and the extract was dried with anhydrous magnesiumsulfate to remove the solvents. In this manner, 8.93 g of the intendedcompound was obtained.

2) Synthesis of4-(4-(1H,1H,2H,2H-heptadecafluorodecyloxy)carbonyl)phenoxysulfonyl-2-diazo-1,2-naphthoquinone

A mixture consisting of 1.61 g of 2-diazo-1,2-naphthoquinone-4-sulfonylchloride, 3.51 g of the just obtained4-(1H,1H,2H,2H-heptadecafluorodecyloxy)carbonyl)phenol, 30 ml ofacetonitrile, and 20 ml of tetrahydrofuran was stirred. To this mixture,5 ml of acetonitrile containing 0.62 g of triethylamine was addeddropwise. After completion of the dropwise addition, the resultingreaction mixture was added dropwise to ice-cold water to obtain aprecipitate. The thus formed precipitate was collected by filtration andwashed with water to obtain a crude product. The crude product thusobtained was then subjected to recrystallization using anacetone/methanol solvent system to isolate 3.03 g of4-(4-(1H,1H,2H,2H-heptadecafluorodecyloxy)carbonyl)phenoxysulfonyl-2-diazo-1,2-naphthoquinonehaving a melting point (decomposition point) of 148° C.

EXAMPLE 6 synthesis of5-(4-(1H,1H,2H,2H-heptadecafluorodecyloxy)carbonyl)phenoxysulfonyl-2-diazo-1,2-naphthoquinone!

This compound was prepared from 2.69 g of2-diazo-1,2-naphthoquinone-5-sulfonyl chloride and 5.84 g of the(4-(1H,1H,2H,2H-heptadecafluorodecyloxy)carbonyl)phenol synthesized inExample 5, part 1), in a manner similar to that in Example 5. In thisway, 3.78 g of the purified compound having a melting point(decomposition point) of 141° to 142° C. was obtained.

EXAMPLE 7

First, a transferable image forming material was prepared according tothe following steps.

A delamination solution having the following composition was coated on apolyethylene terephthalate film support (100 μm in thickness) and driedto make the solution into a delamination layer having a thickness of 0.5μm.

    ______________________________________    Coating solution for delamination layer use    ______________________________________    Alcohol soluble polyamide 7.2 g    (CM-8000, manufactured by Toray Industries,    Inc.; η(20° C.) in 10 wt % methanol solution,    23 cps)    Polyhydroxystyrene        1.8 g    (Resin M, manufactured by Maruzen Oil Co.,    Ltd.; mean molecular weight, 5500)    Methanol                  400 g    Methyl cellosolve         100 g    ______________________________________

Next, each of the four coating solutions as shown in the following Table1 (Y, M, C, and B) was applied onto the thus prepared delamination layerand dried to make the solution into a sensitive resin layer having athickness of 2.4 μm and having a color of yellow (Y), magenta (M), cyan(C) or black (B).

                  TABLE 1    ______________________________________    Sensitive resin layer solutions                     Composition (g)                     Y    M        C      B    ______________________________________    Benzylmethacrylate/methacrylic                       60     60       60   60    acid copolymer (molar ratio,    73/27; viscosity η = 0.12)*.sup.1    Pentaerythritol tetraacrylate                       43.2   43.2     43.2 43.2    Michler's ketone   2.4    2.4      2.4  2.4    2-(o-chlorophenyl)-4,5-diphenyl                       2.5    2.5      2.5  2.5    imidazole dimer    Seika Fast yellow H-0755*.sup.2                       9.4    --       --   --    Seika Fast Carmine 1483*.sup.2                       --     5.2      --   --    Cyanine Blue 4820*.sup.2                       --     --       5.6  --    Mitsubishi Carbon Black MA-100*.sup.2                       --     --       --   6.6    Methyl cellosolve acetate                       560    560      560  560    Methyl ethyl ketone                       280    280      280  280    ______________________________________     *.sup.1 : Viscosity (η) as used herein means a limiting viscosity in     methyl ethyl ketone solution measured at 25° C.     *.sup.2 : Manufactured by Dainichiseika Color & Chemicals Mfg Co., Ltd.

Then, a coating solution having the following composition was appliedonto each of the thus prepared sensitive resin layers and dried to makethe solution into a protective layer having a thickness of 1.5 μm.

    ______________________________________    Coating solution for protective layer use    ______________________________________    Polyvinyl alcohol          60 g    (GL-05, manufactured by The Nippon Synthetic    Chemical Industry)    Water                      970 g    Methanol                   30 g    ______________________________________

In this way, four sensitive transfer sheets (N-P type) coloringsensitive sheets having different colors were obtained, in which asupport was superposed with a delamination layer, a sensitive resinlayer and a protection layer, in that order.

Each of the thus obtained four sensitive transfer sheets was superposedwith a mask using register pins and then exposed to light generated froman ultra-high pressure mercury lamp (2 Kw) at a distance of 50 cm for 15seconds. Thereafter, the thus exposed transfer sheet was subjected toimage development at 35° C. for 15 seconds, 20 seconds, 20 seconds and10 seconds for yellow image, magenta image, cyan image and black image,respectively, using a developing solution having the followingcomposition to obtain four positive color images on the delaminationlayer.

    ______________________________________    Developing solution    ______________________________________           Na.sub.2 CO.sub.3                      15          g           Butyl cellosolve                      1           g           Water      1           l    ______________________________________

Separately from the above steps, an image receiving sheet was preparedas follows. A coating solution having the following composition wasapplied onto a polyethylene terephthalate film (100 μm in thickness) anddried to make the solution into a first image receiving layer having athickness of 20 μm.

    ______________________________________    Coating solution for use in first image receiving layer    ______________________________________    Ethylene/vinyl acetate copolymer                             15 g    (Evaflex 10, manufactured by Mitsui    Polychemical Co., Ltd.; weight ratio, 81%    ethylene/19% vinyl acetate)    Chlorinated polyethylene 0.075 g    (Superclon 07LTA, manufactured by Sanyo-    Kokusaku Pulp Co., Ltd.)    Fluorine-based surfactant                             0.25 g    (Fluorad FC-430, manufactured by 3M)    Toluene                  100 g    ______________________________________

The thus prepared first image receiving layer was further superposedwith a second image receiving layer having a thickness of 2 μn byapplying and drying a coating solution having the following composition.

    ______________________________________    Coating solution for use in second image receiving layer    ______________________________________    Alcohol soluble nylon      1.5 g    (Amilan "CM-8000", manufactured by Toray    Industries, Inc.)    Styrene/maleic acid semi-ester copolymer resin                               1.5 g    (Oxilack SH-101, manufactured by Japan    Catalytic Chemical Industry Co., Ltd.)    Pentaerythritol tetraacrylate                               2.1 g    Michler's ketone           0.02 g    Benzophenone               0.13 g    Methanol                   70 g    Methyl cellosolve          30 g    Compound of the present invention*                               0.3 g    ______________________________________     *4-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-    aphthoquinone

Using the thus prepared four positive color images and the imagereceiving sheet, the following evaluation tests were carried out.

When the image side of a color proofing sheet on which a black image wasformed was placed upon the image receiving side of the image receivingsheet using register pins, and the thus prepared pair of sheets wastreated with a color art transfer machine (CA-600T, manufactured by FujiPhoto Film Co., Ltd.), the black image was transferred perfectly fromthe color proofing sheet together with the delamination layer to theimage receiving sheet. When color proofing sheets on which cyan, magentaand yellow images were respectively formed were transferred to the thusobtained black image by repeating the above procedure, each color imagewas transferred perfectly to the image receiving sheet together witheach delamination layer, thus resulting in the formation of four colorimages.

The image side of the image receiving sheet having four transferredcolor images thus prepared was placed upon a sheet of white art paperand subjected to image transfer in the same manner as the aboveprocedure. Thereafter, the resulting pair of sheets was exposed to lightfrom the base, or support, side of the image receiving sheet using acontact printer equipped with a 1 kw ultra-high mercury lamp (P-607,manufactured by Dainippon Screen Mfg. Co., Ltd. ). When the imagereceiving sheet material was delaminated after 30 seconds of theexposure, the first image receiving layer of the image receiving sheetremained with its support. In other words, the image of interest coveredwith the second image receiving layer was formed on the permanentsupport.

The image transferability and peeling strength between the first andsecond layers of the image receiving sheet are shown in Table 2.

EXAMPLE 8

The process of Example 7 was repeated except that the invention compound4-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-naphthoquinoneused in Example 7 was replaced by another invention compound4-(1H,1H,2H,2H-heptadecafluorodecyl)oxysulfonyl-2-diazo-1,2-naphthoquinone

Image transferability and peeling strength between the first and secondlayers of the image receiving sheet thus obtained were evaluated in thesame manner as in Example 7, with the results shown in Table 2.

EXAMPLE 9

The process of Example 7 was repeated except that the invention compound4-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-naphthoquinoneused in Example 7 was replaced by another invention compound,4-(1H,1H,2H,2H-heptadecafluorodecyl)oxy)sulfonyl-2-diazo-1,2-naphthoquinone.

Image transferability and peeling strength between the first and secondlayers of the image receiving sheet thus obtained were evaluated in thesame manner as in Example 7, with the results shown in Table 2.

EXAMPLE 10

The process of Example 7 was repeated except that the invention compound4-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-naphthoquinoneused in Example 7 was replaced by another invention compound,4-(1H,1H,2H,2H-octafluoropentyl)oxysulfonyl-2-diazo-1,2-naphthoquinone.

Image transferability and peeling strength between the first and secondlayers of the image receiving sheet thus obtained were evaluated in thesame manner as in Example 7, with the results shown in Table 2.

EXAMPLE 11

The process of Example 7 was repeated except that the invention compound4-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-naphthoquinoneused in Example 7 was replaced by another invention compound4-(1H,1H,2H,2H-heptadecafluorodecyl)sulfonyl)phenoxysulfonyl-2-diazo-1,2-naphthoquinone.

Image transferability and peeling strength between the first and secondlayers of the image receiving sheet thus obtained were evaluated in thesame manner as in Example 7, with the results shown in Table 2.

COMPARATIVE EXAMPLE 1

The process of Example 7 was repeated except that the invention compound4-(4-(1H,1H,2H,2H-heptadecafluorodecyl)thio)phenoxysulfonyl-2-diazo-1,2-naphthoquinoneused in Example 7 was not used in this comparative example.

Image transferability and peeling strength between the first and secondlayers of the image receiving sheet thus obtained were evaluated in thesame manner as in Example 7, with the results shown in Table 2.

                  TABLE 2    ______________________________________                         Adhesiveness                         between the                         first and second                         layer (g)    Compounds added to                  Transferability                               before   after    the second layer                  to art paper exposure exposure    ______________________________________    Example 7     good         276      11    (Compound 1)    Example 8     good         220      13    (Compound 2)    Example 9     good         177      25    (Compound 3)    Example 10    good         169      46    (Compound 4)    Example 11    good         230      13    (Compound 5)    Comparative Ex. 1                  picking occurred                               251      275    (no addition) at peeling end    ______________________________________

In the above Table, adhesiveness (peeling strength) between the firstand second image receiving layers was measured under the followingconditions.

1. Image receiving layers, each having an area of 6×16 cm, were preparedas test samples.

2. The moisture of the test samples was adjusted to a constant level bymaintaining the samples under a humid atmosphere of 80% RH for 1 hour at24° C.

3. Mylar tape having a width of 5 cm was applied to the surface of theimage receiving layer.

4. Each of the test samples was cut to a width of 4.5 cm.

5. A terminal portion of the image receiving layer was peeled offtogether with Mylar tape, and the sample was then subjected tointer-layer delamination using a digital force gauge meter (DFG-2K,manufactured by Shimpo Industrial Co., Ltd.) at a delamination speed of1500 mm/min in order to determine the inter-layer adhesion strength.

As shown in Table 2, in the case of the samples of image receivinglayers in which the compound of the present invention was included,adhesiveness between the first and second layers decreased greatly aftertheir exposure to light. As a result, delamination at the time of thetransfer of the image layer to the paper support was smooth, thuscausing no picking at the peeling end, in contrast to the sample of thecomparative example.

EXAMPLE 12

A sensitive solution having the following composition was prepared.

    ______________________________________    4-(4-(1H,1H,2H,2H-        2      g    heptadecafluorodecyl)thio)phenoxysulfonyl-    2-diazo-1,2-naphthoquinone    Polyvinyl butyral (Deanka Butyral,                              2      g    manufactured by Denki Kagaku Kogyo K.K.)    Methyl ethyl ketone       20     ml    ______________________________________

The thus prepared sensitive solution was coated evenly on an aluminumbase board using a whirler and dried to make the solution into asensitive layer having a thickness of 4 μm. After superposing a positiveoriginal, the thus prepared sensitive layer was exposed to light for 100seconds at a distance of 20 cm from a 100 W high pressure mercury lamp.Thereafter, the resulting layer was placed upon a thermal laminationfilm and passed through heating rollers which were controlled at atemperature of 125° C. When the laminated film was peeled off from thesensitive layer immediately after the thermal lamination, an excellentpositive type relief image comprising the unexposed portion of thesensitive composition layer was found on the aluminum base board, whilea negative type relief image comprising the exposed portion of thesensitive layer was found on the delaminated film.

Thus, the present invention provides a 2-diazo-1,2-quinone compoundhaving a substituent group containing an alkyl group which issubstituted by a fluorine atom, as well as an image forming materialprepared by making use of the compound. The compound of the presentinvention has a capacity to change its polarity when exposed to light.Because of this capacity, when the invention compound is added to atleast one layer of a multi-layer recording material and the layers areexposed to light, the adhesiveness of the compound containing layer toits adjoining layer is reduced effectively compared to the adhesivenessbefore the light exposure. The compound of the present invention is alsoapplicable to printing plates, resist materials, and the like.

While the present invention has been described in conjunction withspecific embodiments thereof, it is evident that many alternatives,modifications and variations will be apparent to those skilled in theart in light of the foregoing description. Accordingly, it is intendedto include all such alternatives, modifications and variations as setforth within the spirit and scope of the appended claims.

What is claimed is:
 1. A method of improving delamination in an imageforming material, wherein said material comprises a base support, atleast an image receiving layer provided on said base support, a layeradjacent to the image receiving layer, wherein the layer adjacent isprovided between the image receiving layer and the base support, whereinthe image receiving layer contains a developed image, and wherein atleast the image receiving layer contains a 2-diazo-1,2-naphthoquinonecompound, wherein the 4-position of said compound is substituted by asubstituent group represented by formula (II):

    --SO.sub.2 --O--R.sup.3                                    (II)

wherein R³ represents a substituent group containing an alkyl groupwhich has 2 to 20 carbon atoms and is substituted by at least 3 fluorineatoms; said method comprising:a) laminating a permanent support on theimage receiving layer containing the developed image; and b)delaminating the layer adjacent to the image receiving layer from theimage receiving layer after a flood exposure through the base support totransfer the image receiving layer containing the developed image to thepermanent support.